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High-performance lateral GaN Schottky barrier diode on silicon substrate with low turn-on voltage of 0.31 V, high breakdown voltage of 2.65 kV and high-power figure-of-merit of 2.65 GW cm<sup>−2</sup>
38
Citations
29
References
2019
Year
Wide-bandgap SemiconductorElectrical EngineeringElectronic DevicesEngineeringMo AnodeApplied PhysicsAluminum Gallium NitridePower Semiconductor DeviceGan SbdsGan Power DevicePower ElectronicsSilicon SubstrateMicroelectronicsLow Turn-on VoltageHigh Breakdown VoltagePower Fom
We demonstrate high-performance AlGaN/GaN lateral Schottky barrier diodes (SBDs) with Mo anode and low turn-on voltage of 0.31 V. AlGaN/GaN SBDs with anode to cathode spacing of 6/10/15/20/25 μm achieve a breakdown voltage (BV) of 0.83/1.23/1.62/2.46/2.65 kV, yielding a power figure-of-merit (FOM) of 1.53/1.82/1.77/2.65/2.12 GW cm−2. The power FOM of 2.65 GW cm−2 and BV of 2.65 kV are the best results of AlGaN/GaN SBDs on silicon substrate. Combined with the good dynamic performance with only 10% Ron increase when switched from a −600 V stress for 10 ms, GaN SBDs verify their great promise for future power electronic applications.
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