Tom Wallow - Concepedia

Author

Tom Wallow

Advanced Micro Devices (United States)

Also Known As

T. I. Wallow, T. Wallow, T.I. Wallow, Tom Wallow

Publications

447

Citations

H-Index

Concepts

All Affiliations

Advanced Micro Devices (United States)Lawrence Berkeley National Laboratory GlobalFoundries (United States)IBM (United States)Toshiba (United States)

About

Tom Wallow is an author at Advanced Micro Devices (United States) specializing in applied physics, engineering, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	15	272
2	Applied Physics	11	14	243
3	Natural Sciences	2	2	42
4	Education	1	1	13
5	Health Sciences	1	1	29

Tom Wallow

Publications

363

Citations

H-Index

Page 1

	Year	Citations
Integration of EUV lithography in the fabrication of 22-nm node devices Obert R. Wood, Chiew-Seng Koay, Karen Petrillo, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2009	49
The use of EUV lithography to produce demonstration devices Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2008	42
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu, Microelectronic Engineering Ultraviolet LightPhotonicsEngineeringElectron-beam LithographyPhysics	2009	31
Insertion strategy for EUV lithography Obert R. Wood, John Arnold, Timothy A. Brunner, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyComputer-aided Design	2012	30
Resist pattern prediction at EUV John J. Biafore, Mark D. Smith, Eelco van Setten, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringComputational ChemistryResist Pattern PredictionAcid GenerationElectron Physic	2010	30
The transfer of photoresist LER through etch Adam R. Pawloski, Alden Acheta, Scott Bell, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Polysilicon LerElectrical EngineeringPolysilicon GateEngineeringPhotochemistry	2006	29
EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300 Tom Wallow, Deniz Civay, S. Wang, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Euv Resist PerformanceEngineeringElectron-beam LithographyNm Half-pitchEuv Resists	2012	25
EUV lithography at the 22nm technology node Obert R. Wood, Chiew-Seng Koay, Karen Petrillo, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Technology NodeElectrical EngineeringWafer Scale ProcessingEngineeringElectron-beam Lithography	2010	22
Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist Chawon Koh, Liping Ren, Jacque H. Georger, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticEngineeringElectron-beam LithographyNm Hp PatterningIntegrated Circuits	2009	15
Lithographic metrics for the determination of intrinsic resolution limits in EUV resists Patrick Naulleau, Christopher N. Anderson, Bruno La Fontaine, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMeasurementEducationEuv Resists	2007	13

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