Tom Wallow

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

Ultraviolet Light, Photonics, Engineering +11

Insertion strategy for EUV lithography

Obert R. Wood, John Arnold, Timothy A. Brunner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 30 citations

Short Wavelength Optic, Optical Materials, Engineering +19

Resist pattern prediction at EUV

John J. Biafore, Mark D. Smith, Eelco van Setten et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 30 citations

Engineering, Computational Chemistry, Resist Pattern Prediction +20