John J. Biafore

Statistical simulation of photoresists at EUV and ArF

John J. Biafore, Mark D. Smith, Chris A. Mack et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations

Materials Engineering, Electrical Engineering, Engineering +14

Impact of stochastic effects on EUV printability limits

Peter De Bisschop, Jeroen Van de Kerkhove, Julien Mailfert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 42 citations

Reliability, Reliability Engineering, Engineering +14

Resist pattern prediction at EUV

John J. Biafore, Mark D. Smith, Eelco van Setten et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 30 citations

Engineering, Computational Chemistry, Resist Pattern Prediction +20

Optimization of a virtual EUV photoresist for the trade-off between throughput and CDU

Mark D. Smith, John J. Biafore, Chao Fang · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations · Full text

Engineering, Electron-beam Lithography, Image Sensor +16

Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists

Alessandro Vaglio Pret, Trey Graves, David Blankenship et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 26 citations

Engineering, Electron-beam Lithography, Alternative Photoresist Platforms +24