Peter De Bisschop

Stochastic effects in EUV lithography: random, local CD variability, and printing failures

Peter De Bisschop · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 101 citations

Engineering, Electron-beam Lithography, Measurement +20

Stochastic printing failures in extreme ultraviolet lithography

Peter De Bisschop · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 73 citations

Engineering, Surface Integrity, Stochastic Analysis +21

Stochastic printing failures in EUV lithography

Peter De Bisschop, Eric Hendrickx · 2019 · 53 citations

Determination of the angle of incidence in a Cameca IMS‐4f SIMS instrument

M. Meuris, Peter De Bisschop, J. Leclair et al. · Surface and Interface Analysis · 1989 · 47 citations

Primary Ions, Nuclear Physics, Measurement +21

Impact of stochastic effects on EUV printability limits

Peter De Bisschop, Jeroen Van de Kerkhove, Julien Mailfert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 42 citations

Reliability, Reliability Engineering, Engineering +14