Jeroen Van de Kerkhove

Impact of stochastic effects on EUV printability limits

Peter De Bisschop, Jeroen Van de Kerkhove, Julien Mailfert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 43 citations

Engineering, Materials Engineering, Materials Science +17

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Akiyuki Sugiyama, Hitoshi Komuro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations

Engineering, Manufacturing Engineering, Digital Fabrication +14

Tool-to-tool optical proximity effect matching

Lieve Van Look, Joost Bekaert, Peter De Bisschop et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 14 citations

Engineering, Electrical Engineering, Metrology +12

High-accuracy OPC-modeling by using advanced CD-SEM based contours in the next-generation lithography

Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Manufacturing Engineering, Digital Fabrication +13

Contour quality assessment for OPC model calibration

Paul Filitchkin, Thuy Do, Ir Kusnadi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 12 citations

Architecture, Digital Design, 3D Modeling +13