Ir Kusnadi

SEM image contouring for OPC model calibration and verification

Cyrus Tabery, Hidetoshi Morokuma, Ryoichi Matsuoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 20 citations

Engineering, Measurement, Modeling Tool +25

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Akiyuki Sugiyama, Hitoshi Komuro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations

Engineering, Electron-beam Lithography, Microscopy +29

High-accuracy OPC-modeling by using advanced CD-SEM based contours in the next-generation lithography

Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Advanced Cd-sem, Electron-beam Lithography +24

Challenges of OPC model calibration from SEM contours

Yuri Granik, Ir Kusnadi · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Engineering, Measurement, Experimental Contours +17

Contour quality assessment for OPC model calibration

Paul Filitchkin, Thuy Do, Ir Kusnadi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 12 citations

Engineering, Measurement, Curve Modeling +22