Eelco van Setten

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 70 citations

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 61 citations

High-NA EUV lithography exposure tool: program progress

Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2020 · 58 citations

Engineering, Electron-beam Lithography, Microscopy +24

Epitaxial growth of oxides with pulsed laser interval deposition

Dave H. A. Blank, Gertjan Koster, Guus A.J.H.M. Rijnders et al. · Journal of Crystal Growth · 2000 · 55 citations

Materials Science, Engineering, Applied Physics +3

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 54 citations

Projection Lithography Systems, Optical Engineering, Short Wavelength Optic +19