Jan van Schoot - Concepedia

Author

Jan van Schoot

ASML (Netherlands)ORCID

Also Known As

Jan Van Schoot, Jan van Schoot

Publications

983

Citations

H-Index

Concepts

All Affiliations

ASML (Netherlands)Carl Zeiss (Germany)ASML (United States)Paul Scherrer Institute

About

Jan van Schoot is an author at ASML (Netherlands) specializing in engineering, applied physics, and ophthalmology.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	12	431
2	Applied Physics	8	8	316
3	Health Sciences	4	4	108
4	Medicine	3	3	144
5	Education	1	1	25

Jan van Schoot

Publications

884

Citations

H-Index

Page 1

	Year	Citations
Extreme ultraviolet lithography Dimitrios Kazazis, Jara G. Santaclara, Jan van Schoot, Nature Reviews Methods Primers Materials ScienceUltraviolet LightExtreme Ultraviolet LithographyEngineeringElectron-beam Lithography	2024	74
EUV lithography optics for sub-9nm resolution Bernhard Kneer, Sascha Migura, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2015	66
EUV lithography scanner for sub-8nm resolution Jan van Schoot, Koen van Ingen Schenau, Chris Valentin, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyEuv Lithography ScannerOptic Design	2015	61
The future of EUV lithography: enabling Moore's Law in the next decade Alberto Pirati, Jan van Schoot, Kars Troost, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2017	61
High-NA EUV lithography exposure tool: program progress Jan van Schoot, Eelco van Setten, Kars Troost, EngineeringElectron-beam LithographyMicroscopyTarget FabricationOptic Design	2020	58
High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Journal of Micro/Nanolithography MEMS and MOEMS Projection Lithography SystemsOptical EngineeringShort Wavelength OpticOptical MaterialsEngineering	2017	54
High NA EUV lithography: Next step in EUV imaging Eelco van Setten, Gerardo Bottiglieri, John McNamara,	2019	54
EUV simulation extension study for mask shadowing effect and its correction Hoyoung Kang, Steve Hansen, Jan van Schoot, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Illumination ModelingPhotonicsElectrical EngineeringEngineeringElectron-beam Lithography	2008	44
High-NA EUV lithography exposure tool: advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten,	2020	44
High-NA EUV lithography: pushing the limits Claus Zahlten, Paul Gräupner, Jan van Schoot,	2019	33

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