Winfried Kaiser - Concepedia

Author

Winfried Kaiser

Carl Zeiss (Germany)ORCID

Also Known As

W. Kaiser, Winfried Kaiser, Winfried M. Kaiser

Publications

866

Citations

H-Index

Concepts

All Affiliations

Carl Zeiss (Germany)ASML (Netherlands)Carl Zeiss (United States)ASML (United States)Oxford Instruments (United Kingdom)

About

Winfried Kaiser is an author at Carl Zeiss (Germany) specializing in engineering, instrumentation, and ophthalmology.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	14	423
2	Applied Physics	7	7	282
3	Health Sciences	4	4	71
4	Medicine	4	4	156
5	Education	3	3	38

Winfried Kaiser

Publications

826

Citations

H-Index

Page 1

	Year	Citations
Pushing deep ultraviolet lithography to its limits Michael Totzeck, Wilhelm Ulrich, Aksel Göhnermeier, Nature Photonics EngineeringElectron-beam LithographyPhysicsMicrofabricationBeam Lithography	2007	129
EUV lithography optics for sub-9nm resolution Bernhard Kneer, Sascha Migura, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2015	66
The future of EUV lithography: enabling Moore's Law in the next decade Alberto Pirati, Jan van Schoot, Kars Troost, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2017	61
High-NA EUV lithography exposure tool: program progress Jan van Schoot, Eelco van Setten, Kars Troost, EngineeringElectron-beam LithographyMicroscopyTarget FabricationOptic Design	2020	58
High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Journal of Micro/Nanolithography MEMS and MOEMS Projection Lithography SystemsOptical EngineeringShort Wavelength OpticOptical MaterialsEngineering	2017	54
High-NA EUV lithography exposure tool: advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten,	2020	44
High-NA EUV lithography: pushing the limits Claus Zahlten, Paul Gräupner, Jan van Schoot,	2019	33
Interactions of 3D mask effects and NA in EUV lithography Jens Timo Neumann, Paul Gräupner, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2012	32
High-NA EUV lithography optics becomes reality L. Wischmeier, Paul Gräupner, Peter Kürz, Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptic Design	2020	32
Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio Jens Timo Neumann, Paul Gräupner, Winfried Kaiser, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2013	30

Page 1