Statistics
Publications
19
Citations
766
H-Index
15
Active since
1986
Kars Troost is an author at ASML (Netherlands) specializing in engineering, applied physics, and microscopy.
Publications per year
1986–2021
19
19
Annealing of plasma silicon oxynitride films
C. M. M. Denisse, Kars Troost, F.H.P.M. Habraken et al. · Journal of Applied Physics · 1986 · 74 citations
High-NA EUV lithography exposure tool: program progress
Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2020 · 58 citations
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