Alberto Pirati

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 90 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations

Engineering, Electrical Engineering, Optics +12

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Engineering, Electrical Engineering, Materials Science +8

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 50 citations

Engineering, Manufacturing Engineering, Materials Science +11

Performance optimization of MOPA pre-pulse LPP light source

A. A. Schafgans, Daniel J. Brown, Igor V. Fomenkov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 46 citations

Engineering, Manufacturing Engineering, Physics +13