Concepedia

Joerg Mallman

JM

4

Publications

126

Citations

4

H-Index

2008

Active since

Affiliations

ASML (Netherlands)(Current)

Carl Zeiss (Germany)

ASML (United States)

Joerg Mallman is an author at ASML (Netherlands) specializing in instrumentation, microelectronics, and electronic packaging.

Top concepts

EngineeringInstrumentationMicroelectronicsElectronic PackagingApplied PhysicsMicrofabricationIntegrated CircuitsElectrical EngineeringBusinessLogistics

Publications per year

2008–2014

4

Publications

4

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 50 citations

EUVL system: moving towards production

H. Meiling, Nico Buzing, K. D. Cummings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 32 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +26

EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

Tom Wallow, Deniz Civay, S. Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 25 citations

Euv Resist Performance, Engineering, Electron-beam Lithography +16

Performance of the full field EUV systems

H. Meiling, Edwin Boon, Nico Buzing et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 19 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +18

Rows per page

1–4 of 4