Sjoerd Lok

Extreme ultraviolet lithography: Status and prospects

Jos Benschop, Vadim Banine, Sjoerd Lok et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 97 citations

Ultraviolet Light, Optical Materials, Engineering +16

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 86 citations

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 70 citations

High-NA EUV lithography exposure tool: program progress

Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2020 · 58 citations

Engineering, Electron-beam Lithography, Microscopy +24

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Low-power Electronics, Electrical Engineering, Engineering +15