Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Venue (Journal)

Also Known As

JVST B, Journal of vacuum science and technology., Journal of vacuum science & technology., Microelectronics and nanometer structures, $I Issues for 2003- have issue PDF table of contents title: $a Journal of vacuum science & technology.

11.8K

Publications

241.7K

Citations

944

Concepts

About

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena is a journal.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	139	6K	210.7K
2	Health Sciences	31	101	3.6K
3	Education	24	60	1.7K
4	Business	4	4	89
5	Arts	1	1	13

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

11.8K

Publications

241.7K

Citations

Showing yearly statistics from 2000-2026.

Page 1

	Year	Citations
Band offsets of wide-band-gap oxides and implications for future electronic devices John Robertson Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Wide-bandgap SemiconductorEngineeringWide-band-gap OxidesSemiconductor DeviceElectronic Devices	2000	2K
Nanoimprint lithography Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Uniformity AreaEngineeringElectron-beam LithographyNanodevicesOptoelectronic Devices	1996	1.7K
Mechanical properties of suspended graphene sheets Ian W. Frank, David M. Tanenbaum, Arend M. van der Zande, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena NanosheetEngineeringMultiscale MechanicsMechanical EngineeringGraphene Sheets	2007	1.1K
Sub-10 nm imprint lithography and applications Stephen Y. Chou, Peter R. Krauss, Wei Zhang, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyNanodevicesIntegrated CircuitsBeam Lithography	1997	1.1K
Gas-assisted focused electron beam and ion beam processing and fabrication Ivo Utke, P. Hoffmann, J. Melngailis Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyPrecursor Gas ActivationBeam OpticIon Implantation	2008	1K
Critical Review: Adhesion in surface micromechanical structures Roya Maboudian, Roger T. Howe Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceStrong AdhesionEngineeringSurface PhenomenaCritical Review	1997	826
Recent advances in processing of ZnO S. J. Pearton, D. P. Norton, K. Ip, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Wide-bandgap SemiconductorEngineeringZno DevicesChemistryInorganic Material	2004	670
Mold-assisted nanolithography: A process for reliable pattern replication J. Haisma, M.J. Verheijen, Kees van den Heuvel, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringMold-assisted NanolithographyPattern TransferBiomedical EngineeringPhotopolymerization-replication Step	1996	651
Growth of silicon nanowires via gold/silane vapor–liquid–solid reaction J. Westwater, Dharam Pal Gosain, Shigetaka Tomiya, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceSilicon NanowiresEngineeringElectronic MaterialsCrystalline Defects	1997	650
Microscopic uniformity in plasma etching Richard A. Gottscho, C. W. Jurgensen, D. J. Vitkavage Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicromanufacturingIntegrated CircuitsPlasma Processing	1992	602

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