Daniel Smith

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 86 citations

Progress on EUV pellicle development

Carmen Zoldesi, K. Bal, Brian Blum et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 83 citations

Biology, Materials Science, Euv Defectivity Management +11

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Low-power Electronics, Electrical Engineering, Engineering +15

NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Pär Broman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 34 citations

Spie Microlithography 2015, Engineering, Nxe Pellicle Concept +13

LPP EUV source readiness for NXE 3300B

David C. Brandt, Igor V. Fomenkov, Nigel R. Farrar et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 22 citations

Electrical Engineering, Engineering, Nxe 3300B +15