Concepedia
Statistics
Publications
20
Citations
505
H-Index
14
Active since
1978
Affiliations
ASML (Netherlands)(Current)
KLA (United States)
Nigel R. Farrar is an author at ASML (Netherlands) specializing in natural sciences, optics, and physics.
Publications per year
1978–2015
Performance overview and outlook of EUV lithography systems
Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations
Engineering, Electrical Engineering, Materials Science +8
EUV lithography: NXE platform performance overview
Rudy Peeters, Sjoerd Lok, Joerg Mallman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 50 citations
Engineering, Manufacturing Engineering, Materials Science +11
Performance optimization of MOPA pre-pulse LPP light source
A. A. Schafgans, Daniel J. Brown, Igor V. Fomenkov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 46 citations
Engineering, Manufacturing Engineering, Physics +13
Microstructure and mechanics of crazes in oriented polystyrene
Nigel R. Farrar, Edward J. Kramer · Polymer · 1981 · 43 citations
Natural Sciences, Materials Engineering, Materials Science +12
LPP source system development for HVM
David C. Brandt, Igor V. Fomenkov, Alex I. Ershov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 37 citations · Full text
Natural Sciences, Manufacturing Engineering, Physics +13
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