Alex I. Ershov - Concepedia

Author

Alex I. Ershov

ASML (Netherlands)

Also Known As

A I Ershov, Alex Ershov, Alex I. Ershov

Publications

565

Citations

H-Index

Concepts

All Affiliations

ASML (Netherlands)

About

Alex I. Ershov is an author at ASML (Netherlands) specializing in engineering, electrical engineering, and optoelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	14	450
2	Education	1	1	13
3	Health Sciences	1	1	22
4	Management	1	1	16
5	Natural Sciences	1	1	146

Alex I. Ershov

Publications

500

Citations

H-Index

Page 1

	Year	Citations
Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling Igor V. Fomenkov, David C. Brandt, Alex I. Ershov, Advanced Optical Technologies Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyAbstract Extreme Ultraviolet	2017	146
Performance optimization of MOPA pre-pulse LPP light source A. A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE High Conversion EfficiencyPhotonicsElectrical EngineeringEngineeringLaser-plasma Interaction	2015	45
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W Igor V. Fomenkov, A. A. Schafgans, Yezheng Tao, EngineeringEnergy EfficiencyIndustrial EngineeringFusion PowerLpp Euv Sources	2018	41
LPP EUV source development for HVM David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringLaser Plasma PhysicsLaser-induced BreakdownConversion Efficiency	2007	40
LPP source system development for HVM David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2009	36
Laser-produced plasma light source for EUVL Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringAdvanced Lithography ApplicationsEngineeringElectron-beam LithographyBeam Lithography	2010	22
LPP EUV source readiness for NXE 3300B David C. Brandt, Igor V. Fomenkov, Nigel R. Farrar, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringNxe 3300BLaser-induced BreakdownPrepulse Operation	2014	22
LPP EUV source development for HVM Björn Hansson, Igor V. Fomenkov, N. Böwering, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringLaser Plasma PhysicsLaser-induced BreakdownConversion Efficiency	2006	22
Development of stable extreme-ultraviolet sources for use in lithography exposure systems Igor V. Fomenkov, Bruno La Fontaine, Daniel J. Brown, Journal of Micro/Nanolithography MEMS and MOEMS Ultraviolet LightOptical MaterialsEngineeringElectron-beam LithographyTarget Fabrication	2012	22
Laser produced plasma EUV sources for device development and HVM David C. Brandt, Igor V. Fomenkov, Michael J. Lercel, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringOptical MaterialsEngineeringCollector MirrorNormal Incidence Collector	2012	17

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