Pär Broman

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 81 citations

Sub-10nm Node Lithography, Engineering, Electron-beam Lithography +16

Extending immersion lithography down to 1x nm production nodes

Wim P. de Boeij, Remi Pieternella, Igor Bouchoms et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 38 citations

Engineering, Electron-beam Lithography, Immersion Lithography Roadmap +17

NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Pär Broman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 34 citations

Spie Microlithography 2015, Engineering, Nxe Pellicle Concept +13

ASML NXE pellicle update

Derk Brouns, Pär Broman, Jan-Willem van der Horst et al. · 2019 · 16 citations

Optical Materials, Engineering, Nxe Pellicle Concept +12

CNT pellicles: Imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, R. Jonckheere et al. · 2021 · 11 citations