Emily Gallagher

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

Insertion strategy for EUV lithography

Obert R. Wood, John Arnold, Timothy A. Brunner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 30 citations

Short Wavelength Optic, Optical Materials, Engineering +19

Intensive optimization of masks and sources for 22nm lithography

Alan E. Rosenbluth, David Melville, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations

Mask Optimization, Engineering, Electron-beam Lithography +11

EUV lithography imaging using novel pellicle membranes

Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 28 citations

Engineering, Electron-beam Lithography, Microscopy +17

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Joost Bekaert, Paolo Di Lorenzo, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 25 citations