Kehan Tian

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

Intensive optimization of masks and sources for 22nm lithography

Alan E. Rosenbluth, David Melville, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations

Mask Optimization, Engineering, Electron-beam Lithography +11

Benefits and trade-offs of global source optimization in optical lithography

Kehan Tian, Azalia A. Krasnoperova, David Melville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 27 citations

Optical Materials, Engineering, Electron-beam Lithography +20

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan E. Rosenbluth, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Electron-beam Lithography, Optic Design +16

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

David Melville, Alan E. Rosenbluth, Andreas Wäechter et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 19 citations

Computational Lithography, Engineering, Electron-beam Lithography +18