Obert R. Wood

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 107 citations

Short Wavelength Optic, Optical Materials, Engineering +24

High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma source

W. T. Silfvast, J. J. Macklin, Obert R. Wood · Optics Letters · 1983 · 54 citations

Vacuum ultraviolet loss in magnesium fluoride films

Obert R. Wood, Harold G. Craighead, Jane E. Sweeney et al. · Applied Optics · 1984 · 51 citations

Materials Science, Complex Refractive Index, Optical Materials +9

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations