Obert R. Wood - Concepedia

Author

Obert R. Wood

GlobalFoundries (United States)

Also Known As

Obert R. Wood, Obert R. Wood II, Obert Wood, Obert Wood II

128

Publications

1.2K

Citations

H-Index

Concepts

All Affiliations

GlobalFoundries (United States)IBM (United States)Lawrence Berkeley National Laboratory Toshiba (United States)Advanced Micro Devices (United States)

About

Obert R. Wood is an author at GlobalFoundries (United States) specializing in engineering, applied physics, and microfabrication.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	18	30	713
2	Medicine	7	7	121
3	Health Sciences	4	4	72
4	Natural Sciences	3	3	90
5	Education	1	1	10

Obert R. Wood

Publications

919

Citations

H-Index

Page 1

	Year	Citations
Evaluation of EUV resist materials for use at the 32 nm half-pitch node Thomas I. Wallow, Craig Higgins, Robert L. Brainard, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyOptical Testing	2008	107
High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma source W. T. Silfvast, J. J. Macklin, Obert R. Wood Optics Letters	1983	54
Vacuum ultraviolet loss in magnesium fluoride films Obert R. Wood, Harold G. Craighead, Jane E. Sweeney, Applied Optics Materials ScienceComplex Refractive IndexOptical MaterialsEngineeringOptical Properties	1984	51
Integration of EUV lithography in the fabrication of 22-nm node devices Obert R. Wood, Chiew-Seng Koay, Karen Petrillo, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2009	49
The use of EUV lithography to produce demonstration devices Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2008	42
Influence of ion assistance on the optical properties of MgF_2 Philip Martin, Wayne G. Sainty, R. P. Netterfield, Applied Optics Optical MaterialsX-ray SpectroscopyEngineeringCrystal Grain SizeAbsorption Spectroscopy	1987	42
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements Kenneth A. Goldberg, Anton Barty, Yanwei Liu, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightShort Wavelength OpticMask Inspection ToolsEngineeringElectron-beam Lithography	2006	30
Insertion strategy for EUV lithography Obert R. Wood, John Arnold, Timothy A. Brunner, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyComputer-aided Design	2012	30
Considerations for a free-electron laser-based extreme-ultraviolet lithography program Erik R. Hosler, Obert R. Wood, William A. Barletta, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Accelerator TechnologyFree-electron LasersElectrical EngineeringEngineeringSemiconductor Fab Architecture	2015	26
Synchrotron radiation sources and condensers for projection x-ray lithography J.B. Murphy, D. L. White, Alastair A. MacDowell, Applied Optics Optical MaterialsEngineeringElectron-beam LithographyMicroscopySynchrotron Radiation Source	1993	26

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