Chiew-Seng Koay

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 107 citations

Short Wavelength Optic, Optical Materials, Engineering +24

High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography

Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 88 citations

Extreme Ultraviolet Lithography, Engineering, Optical Properties +9

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

Simi George, W. T. Silfvast, Kazutoshi Takenoshita et al. · Optics Letters · 2007 · 33 citations

Materials Science, Extreme Uv Emission, Optical Materials +14