Bruno LaFontaine

Laser plasma x-ray sources for microlithography

Mohamed Chaker, H. Pépin, V. Bareau et al. · Journal of Applied Physics · 1988 · 70 citations

Optical Materials, Engineering, Electron-beam Lithography +18

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Phase-measuring interferometry using extreme ultraviolet radiation

J. E. Bjorkholm, Alastair A. MacDowell, O. R. Wood et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 31 citations

Engineering, Microscopy, Optical Testing +16

Lithography process control using scatterometry metrology and semi-physical modeling

Kevin Lensing, Jason P. Cain, Amogh Prabhu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 14 citations

Lithography Process Model, Engineering, Electron-beam Lithography +19

High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets

Kai-Chung Hou, Simi George, Aghapi Mordovanakis et al. · Optics Express · 2008 · 14 citations · Full text

Photonics, Advanced Laser Processing, Engineering +10