Jae Uk Lee

EUV lithography imaging using novel pellicle membranes

Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 28 citations

Engineering, Electron-beam Lithography, Microscopy +17

Novel membrane solutions for the EUV pellicle: better or not?

Ivan Pollentier, Jae Uk Lee, Marina Y. Timmermans et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 23 citations

Membrane Structure, Engineering, Carbon Nanotechnology +26

Properties and performance of EUVL pellicle membranes

Emily Gallagher, Johannes Vanpaemel, Ivan Pollentier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 18 citations

Membrane Structure, Engineering, Electron-beam Lithography +16

CNT EUV pellicle: moving towards a full-size solution

Johan Meersschaut, Olivier Richard, Marina Y. Timmermans et al. · 2017 · 16 citations · Full text

Engineering, Carbon-based Material, Nanoelectronics +16

Introducing the EUV CNT pellicle

Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 11 citations