Leon Levasier

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 81 citations

Sub-10nm Node Lithography, Engineering, Electron-beam Lithography +16

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Mark van de Kerkhof, Arthur Minnaert, Marco Pieters et al. · 2018 · 44 citations

Fifth-generation Nxe:3400b Scanner, Electrical Engineering, Wafer Scale Processing +15

EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

Christian Wagner, Jose Bacelar, Noreen Harned et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 33 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +19

Performance results of a new generation of 300-mm lithography systems

Boudewijn Sluijk, Tom Castenmiller, Richard du Croo de Jongh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 29 citations

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Jos de Klerk, Christian Wagner, Richard Droste et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 23 citations

Engineering, Electron-beam Lithography, Microscopy +24