Noreen Harned

Lithography gets extreme

Christian Wagner, Noreen Harned · Nature Photonics · 2009 · 623 citations

First performance results of the ASML alpha demo tool

H. Meiling, H.C. Meijer, Vadim Banine et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 78 citations

Engineering, Electrical Engineering, Microfabrication +5

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 71 citations

Engineering, Computer Engineering, Manufacturing Engineering +7

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Engineering, Electrical Engineering, Materials Science +8

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 50 citations

Engineering, Manufacturing Engineering, Materials Science +11