Vadim Banine - Concepedia

Author

Vadim Banine

Also Known As

Banine, V., Banine, VY Vadim, Banine, Vadim, V Banine, V Y Banine, V. Banine, V. Y. Banine, V.Y. Banine, Vadim Banine, Vadim E. Banine

Publications

1.8K

Citations

H-Index

Concepts

All Affiliations

ASML (Netherlands)Eindhoven University of Technology Philips (Netherlands)Carl Zeiss (Germany)Institute of Spectroscopy

About

Vadim Banine is an author at ASML (Netherlands) specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	23	37	1.5K
2	Natural Sciences	9	9	254
3	Education	2	2	55
4	Management	2	2	48
5	Health Sciences	1	1	97

Vadim Banine

Publications

1.7K

Citations

H-Index

Page 1

	Year	Citations
Physical processes in EUV sources for microlithography Vadim Banine, K. N. Koshelev, G. H. P. M. Swinkels Journal of Physics D Applied Physics Electrical EngineeringEngineeringExtreme Ultraviolet LithographySource VesselMicrofabrication	2011	228
Plasma sources for EUV lithography exposure tools Vadim Banine, Roel Moors Journal of Physics D Applied Physics Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyOptic Design	2004	100
Extreme ultraviolet lithography: Status and prospects Jos Benschop, Vadim Banine, Sjoerd Lok, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightOptical MaterialsEngineeringElectron-beam LithographyBeam Lithography	2008	97
First performance results of the ASML alpha demo tool H. Meiling, H.C. Meijer, Vadim Banine, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Performance BenchmarkingShort Wavelength OpticEngineeringElectron-beam LithographyDemo Tool	2006	78
Sn etching with hydrogen radicals to clean EUV optics Maarten M. J. W. van Herpen, D.J.W. Klunder, Wouter Soer, Chemical Physics Letters PhotonicsHydrogen RadicalsOptical MaterialsEngineeringElectron-beam Lithography	2009	64
Short period La/B and LaN/B multilayer mirrors for ~68 nm wavelength Igor A. Makhotkin, E. Zoethout, Robbert Wilhelmus Elisabeth van de Kruijs, Optics Express	2013	64
EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology J. Beckers, T. H. M. van de Ven, R M van der Horst, Applied Sciences Materials ScienceOptical MaterialsEngineeringRarefied GasPhysics	2019	60
Lithography for now and the future Mark van de Kerkhof, Jos Benschop, Vadim Banine Solid-State Electronics Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	2019	51
Ion energy distributions in highly transient EUV induced plasma in hydrogen T. H. M. van de Ven, P. Reefman, C. A. de Meijere, Journal of Applied Physics EngineeringPlasma SciencePlasma PhysicsPa Hydrogen GasPlasma Theory	2018	49
<title>Extreme-ultraviolet sources for lithography applications</title> Vadim Banine, Johannes Moors Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical EngineeringUltraviolet LightElectrical EngineeringEngineeringExtreme Ultraviolet Lithography	2001	42

Page 1