Roel Moors

Plasma sources for EUV lithography exposure tools

Vadim Banine, Roel Moors · Journal of Physics D Applied Physics · 2004 · 101 citations

Natural Sciences, Manufacturing Engineering, Physics +14

First performance results of the ASML alpha demo tool

H. Meiling, H.C. Meijer, Vadim Banine et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 78 citations

Engineering, Electrical Engineering, Microfabrication +5

Sn etching with hydrogen radicals to clean EUV optics

Maarten M. J. W. van Herpen, D.J.W. Klunder, Wouter Soer et al. · Chemical Physics Letters · 2009 · 67 citations

Natural Sciences, Materials Science, Physics +11

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Mark van de Kerkhof, Arthur Minnaert, Marco Pieters et al. · 2018 · 44 citations

Engineering, Manufacturing Engineering, Digital Fabrication +12

Detection and characterization of carbon contamination on EUV multilayer mirrors

Juequan Chen, Eric Louis, Chris Lee et al. · Optics Express · 2009 · 37 citations · Full text

Natural Sciences, Materials Science, Physics +13