Jos de Klerk

Toward a comprehensive control of full-field image quality in optical photolithography

Donis G. Flagello, Jos de Klerk, Guy Davies et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 27 citations

Natural Sciences, Physics, Biomedical Imaging +16

Latest developments on immersion exposure systems

Jan Mulkens, Jos de Klerk, Martijn Leenders et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations

Engineering, Electrical Engineering, Digital Fabrication +12

Performance of a step-and-scan system for DUV lithography

Gerard de Zwart, Martin A. van den Brink, Richard A. George et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 24 citations

Natural Sciences, Physics, Digital Imaging +12

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Jos de Klerk, Christian Wagner, Richard Droste et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 23 citations

Engineering, Biomedical Engineering, Microelectromechanical Systems +10

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 18 citations

Engineering, Manufacturing Engineering, Quality Engineering +10