Donis G. Flagello

Theory of high-NA imaging in homogeneous thin films

Donis G. Flagello, Tom D. Milster, Alan E. Rosenbluth · Journal of the Optical Society of America A · 1996 · 134 citations

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

Extending optical lithography with immersion

Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 33 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Forbidden pitches for 130-nm lithography and below

Robert Socha, Mircea Dusa, Luigi Capodieci et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 32 citations

Engineering, Electron-beam Lithography, Microscopy +18

Impact of wavefront errors on low k1 processes at extremely high NA

Paul Graeupner, Reiner Garreis, Aksel Goehnermeier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 29 citations

Engineering, Microscopy, Optic Design +19