Concepedia
Statistics
Publications
22
Citations
579
H-Index
15
Active since
1990
Affiliations
ASML (Netherlands)(Current)
Carl Zeiss (Germany)
ASML (United States)
IBM (United States)
Carl Zeiss (United States)
Donis G. Flagello is an author at ASML (Netherlands) specializing in optics, physics, and natural sciences.
Publications per year
1990–2009
Theory of high-NA imaging in homogeneous thin films
Donis G. Flagello, Tom D. Milster, Alan E. Rosenbluth · Journal of the Optical Society of America A · 1996 · 134 citations
Natural Sciences, Biomedical Engineering, Materials Science +17
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations
Engineering, Computer Engineering, Electrical Engineering +13
Extending optical lithography with immersion
Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 34 citations
Engineering, Manufacturing Engineering, Microfabrication +9
Forbidden pitches for 130-nm lithography and below
Robert Socha, Mircea Dusa, Luigi Capodieci et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 33 citations
Engineering, Electrical Engineering, Physics +12
Impact of wavefront errors on low k1 processes at extremely high NA
Paul Graeupner, Reiner Garreis, Aksel Goehnermeier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 29 citations
Natural Sciences, Physics, Biomedical Imaging +13
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