Jan Baselmans - Concepedia

Author

Jan Baselmans

ASML (Netherlands)

Also Known As

J. J. M. Baselmans, Jan Baselmans

Publications

220

Citations

H-Index

Concepts

All Affiliations

ASML (Netherlands)ASML (United States)Carl Zeiss (Germany)

About

Jan Baselmans is an author at ASML (Netherlands) specializing in instrumentation, engineering, and microscopy.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	161
2	Applied Physics	3	3	102
3	Health Sciences	2	2	34
4	Education	1	1	33
5	Medicine	1	1	58

Jan Baselmans

Publications

183

Citations

H-Index

Page 1

	Year	Citations
Full optical column characterization of DUV lithographic projection tools Mark van de Kerkhof, Wim de Boeij, Haico Kok, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical DesignEngineeringIlias SystemMicroscopyLens Interferometer	2004	58
Extending optical lithography with immersion Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptical Lithography	2004	33
Performance of a step-and-scan system for DUV lithography Gerard de Zwart, Martin A. van den Brink, Richard A. George, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyOptic DesignDuv LithographyBeam Optic	1997	23
Image quality in time-resolved transillumination of highly scattering media Dimitrios G. Papaioannou, G. W. ’t Hooft, Jan Baselmans, Applied Optics	1995	22
Optimizing and enhancing optical systems to meet the low k 1 challenge Donis G. Flagello, Robert Socha, Xuelong Shi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringMicroscopyOptic DesignOptical Testing	2003	22
Optimum ArFi laser bandwidth for 10nm node logic imaging performance Paolo Alagna, Omar Zurita, Vadim Timoshkov, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyOptical Transmission SystemLaser ApplicationsOptical Computing	2015	14
Ring test aberration determination and device lithography correlation César M. Garza, Will Conley, Bernard J. Roman, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringMicroscopyOptic DesignOptical TestingOptical Metrology	2001	11

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