Bob Streefkerk

Extending optical lithography with immersion

Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 33 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Immersion lithography: New opportunities for semiconductor manufacturing

Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 30 citations

Materials Science, Engineering, Electron-beam Lithography +15

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 18 citations

Engineering, Education, Computer-mediated Reality +21

Immersion specific defect mechanisms: findings and recommendations for their control

Michael Kocsis, Dieter Van den Heuvel, Roel Gronheid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 16 citations

Engineering, Defect Tolerance, Wafer Scale Processing +17

The next phase for immersion lithography

Harry Sewell, Jan Mulkens, Diane McCafferty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 11 citations

Optical Materials, Engineering, Electron-beam Lithography +18