Nakgeuon Seong

Immersion lithography: New opportunities for semiconductor manufacturing

Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 30 citations

Materials Science, Engineering, Electron-beam Lithography +15

Impact of resist blur on MEF, OPC, and CD control

Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 26 citations

Electrical Engineering, Engineering, Electron-beam Lithography +7

Global optimization of the illumination distribution to maximize integrated process window

Alan E. Rosenbluth, Nakgeuon Seong · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 23 citations

Mathematical Programming, Large-scale Global Optimization, Engineering +22

High-NA lithographic imagery at Brewster's angle

Timothy A. Brunner, Nakgeuon Seong, William D. Hinsberg et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 20 citations

Optical Materials, Engineering, Electron-beam Lithography +20

Integrating DfM components into a cohesive design-to-silicon solution (Invited Paper)

Lars W. Liebmann, Dan Maynard, Kevin McCullen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 14 citations

Engineering, Device Integration, Multidisciplinary Design Optimization +20