Lars W. Liebmann

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 144 citations

Engineering, Electrical Engineering, Materials Science +15

Scaling Challenges for Advanced CMOS Devices

Ajey P. Jacob, Ruilong Xie, Min Gyu Sung et al. · International Journal of High Speed Electronics and Systems · 2017 · 125 citations

Engineering, Computer Engineering, Electrical Engineering +17

Layout impact of resolution enhancement techniques

Lars W. Liebmann · 2003 · 114 citations

Engineering, Computer Engineering, Optoelectronics +14

A 10nm platform technology for low power and high performance application featuring FINFET devices with multi workfunction gate stack on bulk and SOI

Kwangyou Seo, Bala Haran, Divya Gupta et al. · 2014 · 99 citations

Engineering, Computer Engineering, Electrical Engineering +17

Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings

Tejas Jhaveri, Vyacheslav Rovner, Lars W. Liebmann et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 2010 · 98 citations

Engineering, Computer Engineering, Electrical Engineering +17