Lars W. Liebmann - Concepedia

Author

Lars W. Liebmann

IBM (United States)

Also Known As

L Liebmann, L. Liebmann, L. W. Liebmann, Lars Liebmann, Lars W. Liebmann

122

Publications

Citations

H-Index

118

Concepts

All Affiliations

IBM (United States)Carnegie Mellon University GlobalFoundries (United States)The University of Texas at Austin IBM Research - Thomas J. Watson Research Center

About

Lars W. Liebmann is an author at IBM (United States) specializing in engineering, computer engineering, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	24	50	1.7K
2	Social Sciences	11	12	398
3	Natural Sciences	7	7	230
4	Medicine	2	2	77
5	Education	1	1	26

Lars W. Liebmann

Publications

1.8K

Citations

H-Index

Page 1

	Year	Citations
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels Ruijie Xie, P. Montanini, Kerem Akarvardar, EngineeringElectron-beam LithographyFinfet TechnologyMechanical EngineeringWafer Scale Processing	2016	139
Scaling Challenges for Advanced CMOS Devices Ajey P. Jacob, Ruilong Xie, Min Gyu Sung, International Journal of High Speed Electronics and Systems Electrical EngineeringEngineeringVlsi DesignHigh-speed ElectronicsThree-dimensional Heterogeneous Integration	2017	119
Layout impact of resolution enhancement techniques Lars W. Liebmann EngineeringElectron-beam LithographyComputer ArchitectureComputer-aided DesignMulti-resolution Method	2003	114
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings Tejas Jhaveri, Vyacheslav Rovner, Lars W. Liebmann, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems EngineeringVlsi DesignElectronic Design AutomationFinancial BackboneComputer Architecture	2010	98
A 10nm platform technology for low power and high performance application featuring FINFET devices with multi workfunction gate stack on bulk and SOI Kwangyou Seo, Bala Haran, Divya Gupta, EngineeringVlsi DesignFinfet TechnologyIntegrated CircuitsWafer Scale Processing	2014	97
TCAD development for lithography resolution enhancement Lars W. Liebmann, Scott Mansfield, Alfred K. K. Wong, IBM Journal of Research and Development Wafer Scale ProcessingEngineeringVlsi DesignBeam LithographyMicroscopy	2001	74
High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell E. Leobandung, H. Nayakama, D. Mocuta, Electrical EngineeringEngineeringVlsi DesignAdvanced Packaging (Semiconductors)Nm Soi Technology	2005	65
Overcoming scaling barriers through design technology CoOptimization Lars W. Liebmann, Jia Zeng, Xuelian Zhu, EngineeringCollaborative DesignIndustrial EngineeringElectronic Design AutomationElectronic Design	2016	55
High-performance circuit design for the RET-enabled 65-nm technology node Lars W. Liebmann, Arnold E. Barish, Zachary M. C. Baum, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Low-power ElectronicsElectrical EngineeringMask LithographyEngineeringAdvanced Packaging (Semiconductors)	2004	52
The daunting complexity of scaling to 7NM without EUV: pushing DTCO to the extreme Lars W. Liebmann, Albert Chu, Paul Gutwin Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2015	51

Page 1