Jan Mulkens

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, M. M. Hanna, Hannah Wei et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 68 citations

Electrical Engineering, Physical Design (Electronics), Engineering +12

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Alena Andryzhyieuskaya, H. Bakker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 48 citations

Image Reconstruction, High Resolution, Engineering +22

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, M. M. Hanna, Bram Slachter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 44 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +21

Extending optical lithography with immersion

Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 33 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Jan Mulkens, Michael Kubis, Wim Tel et al. · 2018 · 32 citations

Holistic Approach, Engineering, Electron-beam Lithography +18