Wim Tel

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, M. M. Hanna, Bram Slachter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 44 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +21

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Jan Mulkens, Michael Kubis, Wim Tel et al. · 2018 · 32 citations

Holistic Approach, Engineering, Electron-beam Lithography +18

Combined overlay, focus and CD metrology for leading edge lithography

Martin Ebert, Hugo Cramer, Wim Tel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Engineering, Electron-beam Lithography, Microscopy +16

Investigating process variability at ppm level using advanced massive eBeam CD metrology and contour analysis

Bertrand Le-Gratiet, Olivier Mermet, Christian Gardin et al. · 2019 · 14 citations

Predictability and impact of product layout induced topology on across-field focus control

J.-G. Simiz, T. Hasan, Frank Staals et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 12 citations