Michael Kubis

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, M. M. Hanna, Bram Slachter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 46 citations

Engineering, Computer Engineering, Manufacturing Engineering +14

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Henk-Jan H. Smilde, Arie den Boef, Michael Kubis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 33 citations

Engineering, Manufacturing Engineering, Materials Characterization +16

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Jan Mulkens, Michael Kubis, Wim Tel et al. · 2018 · 33 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Holistic optimization architecture enabling sub-14-nm projection lithography

Jan Mulkens, Paul Hinnen, Michael Kubis et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2014 · 31 citations

Engineering, Manufacturing Engineering, Design Automation +12

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Kaustuve Bhattacharyya, Chih-Ming Ke, Guo-Tsai Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Engineering, Electrical Engineering, Metrology +11