Michael Kubis

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, M. M. Hanna, Bram Slachter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 44 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +21

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Henk-Jan H. Smilde, Arie den Boef, Michael Kubis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 33 citations

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Jan Mulkens, Michael Kubis, Wim Tel et al. · 2018 · 32 citations

Holistic Approach, Engineering, Electron-beam Lithography +18

Holistic optimization architecture enabling sub-14-nm projection lithography

Jan Mulkens, Paul Hinnen, Michael Kubis et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2014 · 31 citations

Optical Engineering, Lithography Performance Requirements, Wafer Scale Processing +15

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Kaustuve Bhattacharyya, Chih-Ming Ke, Guo-Tsai Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Advanced Packaging, System On Chip, Integrated Metrology +15