Kaustuve Bhattacharyya

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Henk-Jan H. Smilde, Arie den Boef, Michael Kubis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 33 citations

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Kaustuve Bhattacharyya, Chih-Ming Ke, Guo-Tsai Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Advanced Packaging, System On Chip, Integrated Metrology +15

YieldStar: a new metrology platform for advanced lithography control

Jos G. Maas, Martin Ebert, Kaustuve Bhattacharyya et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 25 citations

Engineering, Electron-beam Lithography, Optical Testing +16

A study of swing-curve physics in diffraction-based overlay

Kaustuve Bhattacharyya, Arie den Boef, Greet Storms et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 23 citations

Engineering, Wave Optic, Target Fabrication +17

New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control

Kaustuve Bhattacharyya · Journal of Micro/Nanolithography MEMS and MOEMS · 2011 · 22 citations

Engineering, Electron-beam Lithography, Measurement +28