Hans Jasper

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 81 citations

Sub-10nm Node Lithography, Engineering, Electron-beam Lithography +16

Performance results of a new generation of 300-mm lithography systems

Boudewijn Sluijk, Tom Castenmiller, Richard du Croo de Jongh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 29 citations

<title>Step-and-scan and step-and-repeat: a technology comparison</title>

Martin A. van den Brink, Hans Jasper, Steve D. Slonaker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 24 citations

Technology Comparison, Wafer Scale Processing, Engineering +12

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 18 citations

Engineering, Education, Computer-mediated Reality +21

Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system

Hans Jasper, Theo Modderman, Mark van de Kerkhof et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 15 citations

Engineering, Microscopy, Optic Design +22