Mircea Dusa

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 89 citations

Engineering, Manufacturing Engineering, Manufacturing Processes +13

Novel diffraction-based spectroscopic method for overlay metrology

Weidong Yang, R. Lowe-Webb, Silvio Rabello et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 47 citations

Engineering, Manufacturing Engineering, Materials Science +16

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Engineering, Computer Engineering, Digital Fabrication +14

Understanding the forbidden pitch phenomenon and assist feature placement

Xuelong Shi, Stephen Hsu, Jiarui Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 39 citations

Natural Sciences, Digital Design, Lighting Design +11

Application challenges with double patterning technology (DPT) beyond 45 nm

Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations

Engineering, Manufacturing Engineering, Digital Fabrication +5