Mircea Dusa

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

Novel diffraction-based spectroscopic method for overlay metrology

Weidong Yang, R. Lowe-Webb, Silvio Rabello et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 47 citations

Optical Materials, Engineering, Microscopy +18

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Cdu Control, Physical Design (Electronics), Array Computing +15

Understanding the forbidden pitch phenomenon and assist feature placement

Xuelong Shi, Stephen Hsu, Jiarui Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 39 citations

Forbidden Pitch Phenomenon, Computational Illumination, Exposure Latitude +18

Application challenges with double patterning technology (DPT) beyond 45 nm

Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations

Engineering, Electron-beam Lithography, Pattern Transfer +26