Bert Vleeming

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

Atomic probes: a search for conduction through a single molecule

C. J. Muller, Bert Vleeming, Mark A. Reed et al. · Nanotechnology · 1996 · 50 citations

Engineering, Physics, Nanotechnology +15

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Cdu Control, Physical Design (Electronics), Array Computing +15

Application challenges with double patterning technology (DPT) beyond 45 nm

Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations

Engineering, Electron-beam Lithography, Pattern Transfer +26

Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Fred de Jong, Bert van der Pasch, Tom Castenmiller et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 29 citations

Engineering, Electron-beam Lithography, Optical Testing +20