Statistics
Publications
6
Citations
260
H-Index
6
Active since
1994
Affiliations
Bert Vleeming is an author at ASML (Netherlands) specializing in engineering, integrated circuit design, and digital fabrication.
Publications per year
1994–2009
6
6
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 89 citations
Engineering, Manufacturing Engineering, Manufacturing Processes +13
Atomic probes: a search for conduction through a single molecule
C. J. Muller, Bert Vleeming, Mark A. Reed et al. · Nanotechnology · 1996 · 50 citations
Application challenges with double patterning technology (DPT) beyond 45 nm
Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations
Engineering, Manufacturing Engineering, Digital Fabrication +5
Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system
Fred de Jong, Bert van der Pasch, Tom Castenmiller et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations
Engineering, Manufacturing Engineering, Digital Fabrication +13
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