Jo Finders

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 86 citations

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Electrical Engineering, Engineering, Specific Resistance +14

Composition of selectively grown InxGa1−xAs structures from locally resolved Raman spectroscopy

Jo Finders, J. Geurts, A. Köhl et al. · Journal of Crystal Growth · 1991 · 61 citations

Materials Science, Engineering, Optical Properties +6

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 61 citations