Statistics
Publications
11
Citations
223
H-Index
10
Active since
2014
Rik Hoefnagels is an author at ASML (Netherlands) specializing in engineering, resist sensitivity, and semiconductor devices.
Publications per year
2014–2019
11
11
Improvements in resist performance towards EUV HVM
Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text
Engineering, Electrical Engineering, Manufacturing Engineering +13
Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text
Engineering, Electrical Engineering, Manufacturing Engineering +13
Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text
Novel high sensitivity EUV photoresist for sub-7nm node
Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text
Engineering, Electrical Engineering, Manufacturing Engineering +13
Progress in EUV resists towards high-NA EUV lithography
Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi et al. · 2019 · 19 citations · Full text
Engineering, Electrical Engineering, Manufacturing Engineering +13
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