Rik Hoefnagels

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Electrical Engineering, Engineering, Specific Resistance +14

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text

Novel high sensitivity EUV photoresist for sub-7nm node

Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 18 citations · Full text

Engineering, Electron-beam Lithography, Image Sensor +18

Progress in EUV resists towards high-NA EUV lithography

Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi et al. · 2019 · 18 citations

High Resolution, Engineering, Electron-beam Lithography +16

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 17 citations · Full text