Concepedia

Rik Hoefnagels

RH

Statistics

Publications

11

Citations

223

H-Index

10

Active since

2014

Affiliations

ASML (Netherlands)(Current)

Paul Scherrer Institute

Tokyo Electron (Japan)

The University of Osaka

JSR (Japan)

Rik Hoefnagels is an author at ASML (Netherlands) specializing in engineering, resist sensitivity, and semiconductor devices.

Publications per year

2014–2019

11

Publications

11

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text

Engineering, Materials Engineering, Materials Science +8

Novel high sensitivity EUV photoresist for sub-7nm node

Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Progress in EUV resists towards high-NA EUV lithography

Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi et al. · 2019 · 19 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

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