Concepedia
Statistics
Publications
11
Citations
274
H-Index
Active since
2004
Affiliations
JSR (Japan)(Current)
ASML (Netherlands)
Tokyo Electron (Japan)
The University of Osaka
Paul Scherrer Institute
Tomoki Nagai is an author at JSR (Japan) specializing in resist sensitivity, semiconductor devices, and engineering.
Publications per year
2004–2016
Sub-40-nm half-pitch double patterning with resist freezing process
Masafumi Hori, Tomoki Nagai, Atsushi Nakamura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 54 citations
Engineering, Electrical Engineering, Materials Science +6
Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography
Naphtali O’Connor, Adam J. Berro, Jeffrey R. Lancaster et al. · Chemistry of Materials · 2008 · 32 citations
Natural Sciences, Materials Engineering, Materials Science +11
Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists
Jae Hyun Kim, Yongho Kim, Sang Mun Chon et al. · Journal of Photopolymer Science and Technology · 2004 · 26 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +14
Recent EUV Resists toward High Volume Manufacturing
Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai · Journal of Photopolymer Science and Technology · 2014 · 26 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +10
Novel EUV resist development for sub-14nm half pitch
Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 25 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
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