Concepedia

Takehiko Naruoka

TN

Statistics

Publications

10

Citations

203

H-Index

10

Active since

2003

Affiliations

JSR (Japan)(Current)

The University of Osaka

Tokyo Electron (Japan)

Paul Scherrer Institute

IMEC

Takehiko Naruoka is an author at JSR (Japan) specializing in engineering, resist sensitivity, and extreme ultraviolet lithography.

Publications per year

2003–2016

10

Publications

10

Recent EUV Resists toward High Volume Manufacturing

Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai · Journal of Photopolymer Science and Technology · 2014 · 26 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +10

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 25 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Novel EUV Resist Development for Sub-14nm Half Pitch

Takakazu Kimoto, Takehiko Naruoka, Hisashi Nakagawa et al. · Journal of Photopolymer Science and Technology · 2015 · 24 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Regulation of Main-Chain Conformation of Permethyldecasilane by Complexation with γ-Cyclodextrin

Kenkichi Sakamoto, Takehiko Naruoka, Mitsuo Kira · Chemistry Letters · 2003 · 21 citations

Natural Sciences, Biochemistry, Chemistry +10

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

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