Oktay Yildirim

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text

Engineering, Materials Engineering, Materials Science +8

Novel high sensitivity EUV photoresist for sub-7nm node

Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 19 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

State-of-the-art EUV materials and processes for the 7nm node and beyond

Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 17 citations · Full text

Engineering, Materials Engineering, Materials Science +13