Concepedia

Oktay Yildirim

OY

Statistics

Publications

8

Citations

176

H-Index

8

Active since

2015

Affiliations

Paul Scherrer Institute(Current)

ASML (Netherlands)

Tokyo Electron (Japan)

The University of Osaka

JSR (Japan)

Oktay Yildirim is an author at Paul Scherrer Institute specializing in microfabrication, applied physics, and optoelectronics.

Top concepts

Publications per year

2015–2018

8

Publications

8

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

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Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 21 citations · Full text

Novel high sensitivity EUV photoresist for sub-7nm node

Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 18 citations · Full text

, , +18

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 17 citations · Full text

State-of-the-art EUV materials and processes for the 7nm node and beyond

Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 17 citations · Full text

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