Statistics
Publications
1
Citations
38
H-Index
1
Active since
2006
Affiliations
ASML (Netherlands)(Current)
Jungchul Park is an author at ASML (Netherlands) specializing in computational electromagnetics, instrumentation, and geometric modeling.
Publications per year
2006–2006
1
1
Application challenges with double patterning technology (DPT) beyond 45 nm
Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations
Engineering, Electron-beam Lithography, Pattern Transfer +26
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