Silvio Rabello

Device based in-chip critical dimension and overlay metrology

Young‐Nam Kim, Jong-Sun Paek, Silvio Rabello et al. · Optics Express · 2009 · 48 citations · Full text

Engineering, Measurement, Microscopy +24

Novel diffraction-based spectroscopic method for overlay metrology

Weidong Yang, R. Lowe-Webb, Silvio Rabello et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 47 citations

Optical Materials, Engineering, Microscopy +18

Uncertainty and sensitivity analysis and its applications in OCD measurements

Pedro Vagos, Jiangtao Hu, Zhuan Liu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 28 citations

Ocd Models, Engineering, Measurement +22

X-ray critical dimension metrology solution for high aspect ratio semiconductor structures

Matthew Wormington, Adam Ginsburg, Israel Reichental et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 2021 · 11 citations

X-ray Spectroscopy, Engineering, Microscopy +20