Martijn Leenders

Extending immersion lithography down to 1x nm production nodes

Wim P. de Boeij, Remi Pieternella, Igor Bouchoms et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 38 citations

Engineering, Electron-beam Lithography, Immersion Lithography Roadmap +17

Mitigation of surface contamination from resist outgassing in EUV lithography

B. Mertens, B. van der Zwan, P.W.H. de Jager et al. · Microelectronic Engineering · 2000 · 29 citations

Engineering, Electron-beam Lithography, Surface Contamination +8

Latest developments on immersion exposure systems

Jan Mulkens, Jos de Klerk, Martijn Leenders et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations

Engineering, Electron-beam Lithography, Microscopy +19

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 18 citations

Engineering, Education, Computer-mediated Reality +21

Extending 1.35 NA immersion lithography down to 1x nm production nodes

Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 16 citations

Engineering, Electron-beam Lithography, Na Immersion Technology +17