Mitigation of surface contamination from resist outgassing in EUV lithography - Concepedia

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Mitigation of surface contamination from resist outgassing in EUV lithography

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References

2000

Year

B. Mertens, B. van der Zwan, P.W.H. de Jager, Martijn Leenders, H. G. C. Werij, Jos Benschop, Anton J. J. van Dijsseldonk

Microelectronic Engineering

EngineeringElectron-beam LithographySurface ContaminationMicrofabricationBeam LithographySurface ScienceApplied PhysicsElectronic PackagingMicroelectronicsSurface ProcessingNanolithography Method

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